A nitriding process based on two distinct nitrogen glow discharge modes, with sample temperatures ranging from 380 0C to 480 0C, was employed to treat the surface of austenitic stainless steel (SS 304). The temperature is controlled exclusively by switching the operation conditions of the discharges. First mode of operation is the conventional one, named cathodic, which runs at higher pressure values (1 mbar) in comparison to the second mode, named anodic, which runs at the pressure range of 10-3 - 10-2 mbar. Cathodic mode is used to quickly heat the sample holder, by the high ion flux. On the other hand, in the anodic mode, due to the lower operation pressure, higher effective ion acceleration takes place, which allows deeper ion implantation into the sample surface. This hybrid process was thoroughly explored regarding the duty cycle and conditions of operation, to achieve optimal performance of the treatments, which led to the attainment of surface hardness for samples of AISI SS 304 as high as 20 GPa and improvements including higher elastic modulus and resistance against corrosion. Detailed comparison among samples treated by this process with others treated by conventional method was done using nanoindentation, Auger Electron Spectroscopy (AES) and corrosion resistance testing.

The deposition of Diamond-like carbon (DLC) films brings excellent mechanical, chemical, optical and electronic properties to a large range of materials. However, a problem to be overcome is its poor adhesion on metallic substrates. Usually, a silicon layer must be deposited on the surface of metals previous to DLC film deposition. In fact, in our experiments using conventional Magnetron Sputtering (MS) technique for deposition of DLC film on metal surfaces (AISI 304 stainless steel, Al 2024, Ti-6Al-4V), the silicon interlayer was crucial to avoid delamination. However, a combined process using MS and high frequency and moderate energy pulses (2.5kV/6µs/1.25 kHz), was successful to grow DLC film without the interlayer. Additionally, by monitoring the stress and the thickness in silicon samples after the processes, it was possible to correlate the conditions of operation with such characteristics. Stress measurements carried out by a profilometer and calculated by Stoney's equation varied from 2 GPa to 10.5 GPa depending on the conditions of operation of the process (pressure, distance source-substrate, frequency, length and intensity of the pulse). The thickness, the composition, the structure and the morphology of DLC coatings deposited in such metallic surfaces were obtained. Tribological and corrosion tests were also performed.

Comparison of the use of indirect immunofluorescence assay (IFA), immunochromatography assay (ICA-BD) and reverse transcription-polymerase chain reaction (RT-PCR) for detecting human respiratory syncytial virus (HRSV) in 306 nasopharyngeal aspirates samples (NPA) was performed in order to assess their analytical performance. By comparing the results obtained using ICA-BD with those using IFA, we found relative indices of 85.0% for sensitivity and 91.2% for specificity, and the positive (PPV) and negative (NPV) predictive values were 85.0% and 91.2%, respectively. The relative indices for sensitivity and specificity as well as the PPV and NPV for RT-PCR were 98.0%, 89.0%, 84.0% and 99.0%, respectively, when compared to the results of IFA. In addition, comparison of the results of ICA-BD and those of RT-PCR yielded relative indices of 79.5% for sensitivity and 95.4% for specificity, as well as PPV and NPV of 92.9% and 86.0%, respectively. Although RT-PCR has shown the best performance, the substantial agreement between the ICA-BD and IFA results suggests that ICA-BD, also in addition to being a rapid and facile assay, could be suitable as an alternative diagnostic screening for HRSV infection in children.

The biggest advantage of plasma immersion ion implantation (PIII) is the capability of treating objects with irregular geometry without complex manipulation of the target holder. The effectiveness of this approach relies on the uniformity of the incident ion dose. Unfortunately, perfect dose uniformity is usually difficult to achieve when treating samples of complex shape. The problems arise from the non-uniform plasma density and expansion of plasma sheath. A particle-in-cell computer simulation is used to study the time-dependent evolution of the plasma sheath surrounding two-dimensional objects during process of plasma immersion ion implantation. Before starting the implantation phase, steady-state nitrogen plasma is established inside the simulation volume by using ionization of gas precursor with primary electrons. The plasma self-consistently evolves to a non-uniform density distribution, which is used as initial density distribution for the implantation phase. As a result, we can obtain a more realistic description of the plasma sheath expansion and dynamics. Ion current density on the target, average impact energy, and trajectories of the implanted ions were calculated for three geometrical shapes. Large deviations from the uniform dose distribution have been observed for targets with irregular shapes. In addition, effect of secondary electron emission has been included in our simulation and no qualitative modifications to the sheath dynamics have been noticed. However, the energetic secondary electrons change drastically the plasma net balance and also pose significant X-ray hazard. Finally, an axial magnetic field has been added to the calculations and the possibility for magnetic insulation of secondary electrons has been proven.

Nitrogen Plasma Immersion Ion Implantation (PIII) has been used to modify the surface chemical structure of Ultra High Molecular Weight Polyethylene (UHMWPE). Grinding and polishing processes based on abrasive papers and alumina pastes have been evaluated with regard to their results on the improvement of polymer surface roughness, which has shown to be of crucial importance for hardness characterization. Raman spectroscopy, XPS, and Nanoindentation tests were used to characterize the modified surfaces. Experimental results has shown that UHMWPE surface mechanical properties such as hardness and elastic modulus can be improved by induced chain cross-linking between the macromolecules on the polymer surface caused by nitrogen PIII. The new material formed on the surface is Diamond Like Carbon (DLC). As a significant improvement in hardness was obtained by DLC synthesis on the treated surface, it is expected a dramatic improvement of abrasion resistance and overall durability of prostheses made with PIII treated UHMWPE.

To improve the performance of critical part components, new methods for surface strengthening are being developed with success, like plasma immersion ion implantation (PIII) and hybrid surface treatments mixing PIII and ion nitriding processes. A combination of high pressure (4 × 10¹Pa), moderate temperature (up to 450ºC) glow discharge nitriding with low pressure (8 × 10-2Pa) and low DC bias voltage ion nitriding (or DC PIII) was implemented. Depending on the particular conditions of the treatment and the depth probed, mixed phases of gammaN and epsilon were measured in the treated SS304 steel sample. This near surface modification resulted in an improved hardness (up to a factor of 2.7 ×) of the sample which could also enhance its wear properties. Surface modification of Ti6Al4V alloy and SS304 steel by a combination of PIII and subsequent ion nitriding was investigated as well. Nitrogen ions were implanted into the specimens at 15 keV and then ion nitrided at low pressure (7 × 10-2Pa) with a bias of -800 V. Compared to the untreated samples, the hardness of Ti6Al4V alloy and the steels could be improved significantly. AES results indicated high retained doses in both samples, confirming the high efficiency of this hybrid process.

SAE 1020 is a widely used plain carbon steel, as mortar reinforcement in buildings and small machine parts. But aside from good mechanical properties, its surface suffer from severe corrosion and high wear rate, due to modest hardness. Chromium (Cr) in excess of 12% in Fe alloys renders them resistant to several corrosive attacks. So we tried to introduce Cr in such amounts into the surface of that steel. Cr films were deposited by electron beam on SAE 1020 steel. Bombarding the Cr film either by nitrogen Plasma Immersion Ion Implantation (PIII) or nitrogen ion beam (IB), Cr atoms were recoil introduced into the Fe matrix. Normally, in the recoil process, heavy atoms are used, but in this set of experiments we used a relatively lighter atom, viz. nitrogen. SRIM simulation was used to show Cr atoms range in the steel matrix after being hit by nitrogen atoms. AES analysis showed ranges far beyond the calculated figures and in percentages above 13at. %, enough to the purposes of these works. Preliminary corrosion results showed remarkable enhancement under corrosive attack.

The treatment of surfaces by plasma immersion ion implantation requires pulsed power modulators to provide negative high voltage pulses. To achieve this requirement, we have developed three basic circuit configurations in our laboratory: pulse forming network (PFN), hard-tube pulser (HT) and Blumlein line. In this paper we discuss these three types of circuit topologies.As experimental results, first we present the voltage/current characteristic waveforms of PFN and HT pulsers in the PIII treatment of different materials (aluminum, silicon and stainless steel) as well we describe the surface characterization of the materials thereof treated.And finally,we show recent high voltage tests of a high voltage Blumlein pulser (150kV/300A/1mus) to be used in surface treatments of polymers and aluminum alloys.

This paper describes the general characteristics of spherical tokamaks, or spherical tori, with a brief overview of work in this area already performed or in progress at several institutions worldwide. The paper presents also the steps in the development of the ETE (Experimento Tokamak Esférico) project, its research program, technical characteristics and operating conditions as of December, 2002 at the Associated Plasma Laboratory (LAP) of the National Space Research Institute (INPE) in Brazil.

A Fast Neutral Lithium Beam Probe (FNLBP) is being developed, in order, to perform measurement of the boundary plasma density in discharges of the Spherical Tokamak ETE, recently built at LAP/INPE. This plasma diagnostic method is adequate for use in fusion devices because it does not perturb the plasma and it provides data with high space and time resolution for the entire discharge lifetime. To obtain reliable measurements, however, FNLB probing depends on high signal-to-noise ratio (S/N) during beam emission spectroscopy of the Li beam injected into the plasma, specially if density uctuation measurements are sought. Hence, our effort is been focused in the achievement of high intensity Li0 output. Recently, probing of a low temperature (T ~ 5eV) and low density target plasma (n ~ 10(10) cm-3) produced in a plasma immersion ion implantation experiment (PIIIE) was performed by a2-5keV FNLBP. The method used for the density determination of this glow discharge plasma was based on the comparison of the fluxes of 6708 Å photons emitted from Li0 beam injected into nitrogen gas that filled the PIIIE chamber and from the same beam injected into the plasma discharge. For this case, the attenuation of the beam was neglected. The plasma density measured was n e = 8.5 × 10(10) cm-3 for pressure of operation of p = 7.0 × 10-4 mbar and n e = 7.2 × 10(10) cm-3 for p = 4.6 × 10-4 mbar. These results are in good agreement with Langmuir probe data. The success of this measurement was only possible after a tenfold increase in the Li+ output and the increase of the lifetime of Li source by vitrification of the beta-eucryptite source, besides the optimization of the optical detection system and the neutralization of the beam. Presently, a new 10keV FNLBP is been developed to probe ETE plasma. For this case, where the Li beam will be strongly attenuated by the high density plasma (n e ~ 10(13) cm-3), the method of density reconstruction from the whole photon flux profile will be used. All the improvements performed during the operation of the old FNLBP device, will be implemented on this new FNLBP.

In the present study we use x-ray diffraction methods to characterize the surface of Si wafers irradiated with nitrogen by Plasma Immersion Ion Implantation. This is a non-line-of-sight ion implantation method, which allows three-dimensional treatment of materials including semiconductors, metals and dielectrics. The atomic concentration profiles in the implanted Si wafers were measured by Auger electron spectroscopy. The (004) Si rocking curve ( omega-scan) was measured in a high resolution x-ray diffractometer equipped with a Ge (220) four-crystal monochromator before and after implantation. A distortion of the Si (004)-rocking curve was clearly observed for the as-implanted sample. This rocking curve was successfully simulated by dynamical theory of x-ray diffraction, assuming a Gaussian strain profile through the implanted region. The analysis made by x-ray difraction and Auger electron spectroscopy revealed successful implantation of ions with ac- cumulated nitrogen dose of 1.5 x <FONT FACE=Symbol>10(17) </FONT>cm-3 .The Si wafers can be used as high sensitivity monitors in the Plasma Immersion Ion Implantation process, especially at the low dose range.